The grating and reticle , which linewidth errors are less than 10 % nominal linewidth , are fabricated by ldw . for the first time metallic mesh film with area 200mm 200mm fabricated by using ldw photolithography and coating technology 本文完成了直角坐標(biāo)激光直寫光刻技術(shù)研究,開展了離焦激光直寫光刻的工藝研究,制作了光柵和網(wǎng)格分劃板,線寬誤差控制在10 %以內(nèi)。